“Exposed” Artist: Andreas Hablutzel

Andreas Hablutzel, Untitled, 2001, Archival pigment ink print, Courtesy of the Artist

Andreas Hablutzel

Andreas Hablutzel’s work is on view at the ICA in the exhibition Exposed: Today’s Photography/Yesterday’s Technology thru Sept 19, 2010.

Andreas Hablutzel’s photographs document the site of the former concentration camp Buchenwald in Weimar, Germany sixty-five years after its liberation. The pastoral landscapes depicted here defy the horrors that were committed at this infamous site. However, the images transmit an ominous sense of evil. One knows that something has happened here, but it is not immediately apparent. Instead it is the memory of the place that survives in these images, the haunting inexplicability of Nazi atrocities.

In order to capture that foreboding quality in his photographs, Hablutzel has chosen to use a pinhole camera, the most elemental form of camera capable of producing an image. It consists of a closed light-proof box with a pinhole opening on one surface. Through the pinhole, light projects an inverted image of the subject onto a flat, light-sensitive material that has been placed on an internal surface opposite the opening.  Because so little light enters through the miniscule opening, the negative material must be exposed for a long time. Therefore, the resulting images have a soft overall definition rather than crisp detail.

Andreas Hablutzel is a photographer and architect living in Brooklyn, New York. He received a BA from Rice University in Houston, a Masters of Architecture from the Southern California Institute of Architecture in Los Angeles, and an MA in Photographic Studies from the University of Westminster in London. His work has been exhibited in the United States, Switzerland, the United Kingdom, and Estonia.